JJAP Conference Proceedings

JJAP Conf. Proc. 3, 011108 (2015) doi:10.7567/JJAPCP.3.011108

Enhancement of photoluminescence from Cu-doped β-FeSi/Si heterostructures

Yoshihito Maeda1,2, Takahide Tatsumi1, Yuki Kawakubo1, Yuya Noguchi1, Kosuke Morita1, Hiroyuki Kobayashi1, Kazumasa Narumi2

  1. 1Department of Computer Science and Electronics, Kyushu Institute of Technology, Iizuka, Fukuoka 820-8502, Japan
  2. 2Advanced Science Research Center, Japan Atomic Energy Agency, Tokai, Ibaraki 319-1195, Japan
  • Received July 01, 2014
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We have investigated photoluminescence (PL) behaviors of the Cu-doped β-FeSi2 thin film/Si heterostructure. Pronounced enhancement of an intrinsic A band and an impurity-related C band emissions has been observed in all the Cu-doped samples. The photo-carrier injection (PCI)-PL measurements have revealed that the PL enhancement is attributed to dynamic process of migration of holes where a repeated trap process of holes can be controlled by Cu-doping.

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