JJAP Conf. Proc. 3, 011301 (2015) doi:10.7567/JJAPCP.3.011301
Deposition of magnesium silicide nanoparticles by the combination of vacuum evaporation and hydrogen plasma treatment
- 1Institute of Physics of the ASCR, v. v. i., Cukrovarnická 10, 162 00 Praha 6, Czech Republic
- 2Czech Technical University in Prague, Faculty of Biomedical Engineering, Sitna 3105, 27201 Kladno, Czech Republic
- Received July 31, 2014
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The radio frequency plasma enhanced chemical vapor deposition (PECVD) of the hydrogenated amorphous silicon (a-Si:H) combined with the vacuum evaporation of magnesium followed by the hydrogen plasma treatment has been successfully applied for the in-situ deposition of magnesium silicide nanoparticles embedded in hydrogenated amorphous silicon thin layers. The homogeneous coverage of a-Si:H surface by magnesium silicide nanoparticles with diameter below 10 nm has been confirmed by the scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS).
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