JJAP Conference Proceedings

JJAP Conf. Proc. 3, 011301 (2015) doi:10.7567/JJAPCP.3.011301

Deposition of magnesium silicide nanoparticles by the combination of vacuum evaporation and hydrogen plasma treatment

Jiri Stuchlik1, The Ha Stuchlikova1, Anna Artemenko1, Zdenek Remes1,2

  1. 1Institute of Physics of the ASCR, v. v. i., Cukrovarnická 10, 162 00 Praha 6, Czech Republic
  2. 2Czech Technical University in Prague, Faculty of Biomedical Engineering, Sitna 3105, 27201 Kladno, Czech Republic
  • Received July 31, 2014
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The radio frequency plasma enhanced chemical vapor deposition (PECVD) of the hydrogenated amorphous silicon (a-Si:H) combined with the vacuum evaporation of magnesium followed by the hydrogen plasma treatment has been successfully applied for the in-situ deposition of magnesium silicide nanoparticles embedded in hydrogenated amorphous silicon thin layers. The homogeneous coverage of a-Si:H surface by magnesium silicide nanoparticles with diameter below 10 nm has been confirmed by the scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS).

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