JJAP Conference Proceedings

JJAP Conf. Proc. 5, 011105 (2017) doi:10.7567/JJAPCP.5.011105

Analysis of oxidation behavior in nanocrystal β-FeSi/Si composites by rutherford backscattering spectrometry and computation of diffusion flux

Mikihiro Arima1, Masaya Fuchi1, Kazumasa Narumi2, Yoshihito Maeda1,2

  1. 1Department of Computer Science and Electronics, Kyushu Institute of Technology, Fukuoka 820-8502, Japan
  2. 2Takasaki Ion Accelerators for Advanced Radiation Application, National Institutes for Quantum and Radiological Science and Technology, (QST), Takasaki, Gunma 370-1292, Japan
  • Received August 03, 2016
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We have investigated oxidation behaviors of nanocrystal (NC) β-FeSi2/Si composites by Rutherford Backscattering Spectrometry (RBS) and computation of diffusion fluxes. The oxidation is controlled by diffusion of the O flux from the surface and the Si flux toward the Matano–Boltzmann (M–B) interface. The time dependence of the location of the M–B interface was determined. We proposed a model for oxidation of the composite that is different from oxidation of Si controlled by O diffusion through SiO2 at the surface.

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