JJAP Conf. Proc. 7, 011205 (2018) doi:10.7567/JJAPCP.7.011205
Subnanopore structural change of time-elapsed silica PECVD films elucidated by slow positron annihilation and ellipsometric porosimetry
- 1National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8565, Japan
- 2Toray Research Center, Inc., Otsu, Shiga 520-8567, Japan
- 3Hiroshima University, Higashi-Hiroshima, Hiroshima 739-8527, Japan
- Received October 23, 2017
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To examine the effect of elapsed time on the nanoporosity, subnanoporous silica thin films, fabricated by plasma-enhanced chemical vapor deposition (PECVD), were investigated by means of low-energy positron annihilation lifetime spectroscopy and vapor-adsorption ellipsometric porosimetry. The structural change of the subnanoscaled pores was elucidated by comparison of the as deposited and 6-month-old films. It is expected that the change in the subnanoscaled pores of the present films, after exposure to air for half a year, is due to the adsorption of water molecules from air, followed by the filling up the nanoscaled pores as well as partial polycondensations between silanol groups at the silica grain boundaries of the films.
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